XRD study of gas sensitive SnO/sub 2/ thin films deposited by spray pyrolysis method

Author

Korotcenkov, G. ; Schwank, J. ; DiBattista, M. ; Brinzari, V.

Author_Institution

Dept. of Microelectron., Tech. Univ., Chisinau, Moldova

Volume

1

fYear

1999

fDate

5-9 Oct. 1999

Firstpage

319

Abstract

The results of research of SnO₂ thin film structure using XRD diffraction is presented in this report. We discuss the influence of conditions of film deposition and modes of heat treatment in the range of temperatures 400-900°C on crystallite size and predominant orientation. It was determined that SnO₂ films, deposited by spray pyrolysis method are textured polycrystalline films with nano-size crystallites (t=8-20 nm). Predominant orientation of crystallites ((110) or (200)), forming the gas sensitive surface, depends on film thickness and used modes of deposition. We also have shown that the structure of studied SnO₂ films was very stable in oxygen atmosphere

Keywords

X-ray diffraction; gas sensors; semiconductor growth; semiconductor materials; semiconductor thin films; spray coatings; tin compounds; 400 to 900 C; 8 to 20 nm; SnO/sub 2/; XRD; crystallite size; film deposition; gas sensitive SnO/sub 2/ thin films; heat treatment; nano-size crystallites; predominant orientation; spray pyrolysis method; thin film structure; Atmosphere; Crystallization; Diffraction; Heat treatment; Spraying; Surface treatment; Temperature distribution; Temperature sensors; Transistors; X-ray scattering;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 1999. CAS '99 Proceedings. 1999 International

Conference_Location

Sinaia, Romania

Print_ISBN

0-7803-5139-8

Type

conf

DOI

10.1109/SMICND.1999.810527

Filename

810527