DocumentCode :
3482656
Title :
A novel soft and fast recovery diode (SFD) with thin p-layer formed by Al-Si electrode
Author :
Mori, Mutsuhiro ; Yasuda, Yasumichi ; Sakurai, Naoki ; Sugawara, Yoshitaka
Author_Institution :
Hitachi Ltd., Ibaraki, Japan
fYear :
1991
fDate :
22-24 Apr 1991
Firstpage :
113
Lastpage :
117
Abstract :
A novel, soft and fast recovery diode (SFD) is presented which has extremely thin p-layers formed by an Al-Si electrode and deep p+ -layers. By using the thin p-layer, the hole density in the n--layer close to the p-n junction is reduced, and a 1/2.5 lower recovery current peak, 1/3 lower recovery current change, and 1.5 times faster recovery time are realized compared to a conventional p-n diode. Moreover, increasing the barrier height of the p-layer causes the leakage current and forward voltage drop to decrease. It is also demonstrated that electrical noise and turn-on loss of an IGBT module in an inverter circuit can be significantly improved by using the SFD as a free wheeling diode
Keywords :
electron device noise; semiconductor diodes; Al-Si electrode; AlSi-Si; IGBT module; barrier height; deep p+-layers; electrical noise; forward voltage drop; free wheeling diode; hole density; inverter circuit; leakage current; soft fast recovery diode; thin p-layers; turn-on loss; Acoustical engineering; Circuit noise; Electrodes; Insulated gate bipolar transistors; Inverters; Laboratories; Leakage current; Noise reduction; Schottky diodes; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 1991. ISPSD '91., Proceedings of the 3rd International Symposium on
Conference_Location :
Baltimore, MD
ISSN :
1063-6854
Print_ISBN :
0-7803-0009-2
Type :
conf
DOI :
10.1109/ISPSD.1991.146079
Filename :
146079
Link To Document :
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