Title :
Bernas source for the Precision Implant 9200
Author :
Vella, M.C. ; Hacker, W. ; Price, S.W. ; Reilly, Tom
Author_Institution :
Electro-Graph, Carlsbad, CA, USA
Abstract :
A Bernas plasma source is in beta testing for the Applied Materials Precision Implant 9000/9200 series. The most distinctive feature of this source is a new two and a half turn pigtail filament. Compared with a Sigma Freeman, initial Bernas operation with P+ , B+ and BF2+ has demonstrated spec beam with higher transfer ratios and double source life for a range of high current, low energy processes
Keywords :
beam handling techniques; ion implantation; ion sources; particle beam diagnostics; plasma production; 20 keV; Applied Materials Precision Implant 9000/9200 series; B; B+; BF2; BF2+; Bernas plasma source; P; P+; beam currents; beta testing; double source life; high current low energy processes; pigtail filament; transfer ratios; Implants; Insulation; Magnetic fields; Materials testing; Plasma sources; Power supplies; Reproducibility of results; Stability; Tungsten; Wire;
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
DOI :
10.1109/IIT.1996.586363
