DocumentCode
3483275
Title
Effects of storage conditions on ISFET performance
Author
Liao, Eva ; Aw, Chak-Yoon ; Cheung, Peter W. ; Whiting, Cameron ; Wojtowicz, Andy ; Moinpour, Mansour
Author_Institution
Dept. of Electr. Eng., Washington Univ., Seattle, WA, USA
fYear
1988
fDate
4-7 Nov. 1988
Firstpage
738
Abstract
Ion-sensitive field-effect transistors (ISFETs) have been fabricated using low-pressure chemical-vapor-deposited (LPCVD) silicon nitride on top of silicon dioxide as a double gate dielectric. The double dielectric layer provides improved ion blocking for the gate dielectric in solution with enhanced pH sensitivity over time. Three different storage conditions were tested using the sensor at room temperature: dry storage, dry storage for three weeks followed by wet storage, and continuous wet storage. Significant differences were observed in the ISFETs´ characteristics due to the different storage conditions. An increase in pH sensitivity was observed when they were stored wet, approaching the theoretical Nernst potential at 25 degrees C.<>
Keywords
electric sensing devices; insulated gate field effect transistors; pH measurement; 25 degC; ISFET performance; Nernst potential; Si/sub 3/N/sub 4/-SiO/sub 2/; double gate dielectric; dry storage; low-pressure chemical vapour deposition; pH sensitivity; storage conditions effects; wet storage;
fLanguage
English
Publisher
ieee
Conference_Titel
Engineering in Medicine and Biology Society, 1988. Proceedings of the Annual International Conference of the IEEE
Conference_Location
New Orleans, LA, USA
Print_ISBN
0-7803-0785-2
Type
conf
DOI
10.1109/IEMBS.1988.94986
Filename
94986
Link To Document