Implant 9500xR: a high productivity implantation system for 5E10-1E16 ion.cm-2 dose and 5 keV-750 keV energy applications

The capability of the Implant 9500xR ion implanter has been extended to become an all purpose implanter. The Implant 9500xR not only has all capability of a high current implanter, but it can also achieve very stable beam currents well below 1 mA (c.f. medium current implanters) for low dose applications. The ion energy range has also been extended to 750 keV for high energy applications and low energy of 5 keV. The throughput of the Implant 9500xR has been optimised to 220 wph, as a mechanical limit for 200 mm wafers, with substantially faster pumping of the wafer loader, a more effective transfer mechanism and significant enhancements to the system automation. Contamination has been minimised by optimising mechanical design of the beamline and processor. These enhancements has rendered Implant 9500xR as a cost effective implanter for the present and future technologies