DocumentCode
3483537
Title
Ion implant COO modeling: does it give us what we want?
Author
Beeston, Brian E P
Author_Institution
Implant Div., Appl. Mater., West Sussex, UK
fYear
1996
fDate
16-21 Jun 1996
Firstpage
474
Lastpage
477
Abstract
A Cost-of-Ownership model with an implant specific throughput calculator precursor is proposed, together with standardized input parameters to enable comparative cost-per-wafer analyses to be undertaken, and the necessary input cells to permit useful capacity planning. The throughput calculator has been tested experimentally, and the COO model has been used to illustrate its effectiveness as a engineering development priority determiner
Keywords
costing; economics; ion implantation; semiconductor device manufacture; capacity planning; cost-of-ownership model; cost-per-wafer analysis; engineering development priorities; ion implantation; throughput; throughput calculator; Capacity planning; Foundries; Implants; Personnel; Production; Semiconductor device manufacture; Semiconductor device modeling; Testing; Throughput; Virtual manufacturing;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location
Austin, TX
Print_ISBN
0-7803-3289-X
Type
conf
DOI
10.1109/IIT.1996.586403
Filename
586403
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