Title :
Ion implant COO modeling: does it give us what we want?
Author :
Beeston, Brian E P
Author_Institution :
Implant Div., Appl. Mater., West Sussex, UK
Abstract :
A Cost-of-Ownership model with an implant specific throughput calculator precursor is proposed, together with standardized input parameters to enable comparative cost-per-wafer analyses to be undertaken, and the necessary input cells to permit useful capacity planning. The throughput calculator has been tested experimentally, and the COO model has been used to illustrate its effectiveness as a engineering development priority determiner
Keywords :
costing; economics; ion implantation; semiconductor device manufacture; capacity planning; cost-of-ownership model; cost-per-wafer analysis; engineering development priorities; ion implantation; throughput; throughput calculator; Capacity planning; Foundries; Implants; Personnel; Production; Semiconductor device manufacture; Semiconductor device modeling; Testing; Throughput; Virtual manufacturing;
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
DOI :
10.1109/IIT.1996.586403
