DocumentCode :
3483748
Title :
Experimental design for equipment qualification and matching
Author :
Tripsas, Nick ; Johnson, Ronald
Author_Institution :
Adv. Micro Devices Inc., Sunnyvale, CA, USA
fYear :
1996
fDate :
16-21 Jun 1996
Firstpage :
509
Lastpage :
511
Abstract :
Process qualifications are required as new equipment is added to a fab to ensure good product quality. For Ion Implanters, dose-matching of machines is a necessary first step in this procedure. Split-lot qualifications are also commonly run prior to releasing a new machine to production. The design of these experiments is crucial to efficient qualification. The use of a fractional factorial design ensures that a lot is split differently at each implant layer. Statistical analysis can independently check each implant for significant differences in electrical parameters. These methods have many advantages over more traditional approaches
Keywords :
design of experiments; ion implantation; semiconductor device manufacture; statistical analysis; dose matching; electrical parameters; equipment matching; equipment qualification; experimental design; fractional factorial design; ion implanter; process qualification; product quality; production machine; semiconductor fab; split-lot qualification; statistical analysis; Control charts; Current density; Current measurement; Density measurement; Design for experiments; Implants; Noise reduction; Production; Qualifications; Statistical analysis;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
Type :
conf
DOI :
10.1109/IIT.1996.586416
Filename :
586416
Link To Document :
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