• DocumentCode
    3483748
  • Title

    Experimental design for equipment qualification and matching

  • Author

    Tripsas, Nick ; Johnson, Ronald

  • Author_Institution
    Adv. Micro Devices Inc., Sunnyvale, CA, USA
  • fYear
    1996
  • fDate
    16-21 Jun 1996
  • Firstpage
    509
  • Lastpage
    511
  • Abstract
    Process qualifications are required as new equipment is added to a fab to ensure good product quality. For Ion Implanters, dose-matching of machines is a necessary first step in this procedure. Split-lot qualifications are also commonly run prior to releasing a new machine to production. The design of these experiments is crucial to efficient qualification. The use of a fractional factorial design ensures that a lot is split differently at each implant layer. Statistical analysis can independently check each implant for significant differences in electrical parameters. These methods have many advantages over more traditional approaches
  • Keywords
    design of experiments; ion implantation; semiconductor device manufacture; statistical analysis; dose matching; electrical parameters; equipment matching; equipment qualification; experimental design; fractional factorial design; ion implanter; process qualification; product quality; production machine; semiconductor fab; split-lot qualification; statistical analysis; Control charts; Current density; Current measurement; Density measurement; Design for experiments; Implants; Noise reduction; Production; Qualifications; Statistical analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology. Proceedings of the 11th International Conference on
  • Conference_Location
    Austin, TX
  • Print_ISBN
    0-7803-3289-X
  • Type

    conf

  • DOI
    10.1109/IIT.1996.586416
  • Filename
    586416