Title :
DMG AlGaN/GaN HEMT: A solution to RF and wireless applications for reduced distortion performance
Author :
Kumar, Sona P. ; Agrawal, Anju ; Chaujar, Rishu ; Gupta, Mridula ; Gupta, R.S.
Author_Institution :
Dept. of Electron. Sci., Univ. of Delhi, New Delhi
Abstract :
The study thus proves that DMG AlGaN/GaN HEMT is a potential candidate for growing requirement of high linearity and low distortion in the telecommunication industry due to reduced SCEs and a more uniform electric field distribution. The study also shows that the linearity performance improves further on using lower doping and thickness of the barrier layer and increased metal gate workfunction difference; thus presenting DMG AlGaN/GaN HEMT as a promising solution for high performance RF applications.
Keywords :
aluminium compounds; gallium compounds; high electron mobility transistors; microwave circuits; radiocommunication; AlGaN-GaN; RF applications; distortion performance reduction; dual material gate; telecommunication industry; uniform electric field distribution; wireless applications; Aluminum gallium nitride; Conducting materials; Electrons; Gallium nitride; HEMTs; Linearity; Mobile communication; Radio frequency; Semiconductor device noise; Transconductance;
Conference_Titel :
Microwave Conference, 2008. APMC 2008. Asia-Pacific
Conference_Location :
Macau
Print_ISBN :
978-1-4244-2641-6
Electronic_ISBN :
978-1-4244-2642-3
DOI :
10.1109/APMC.2008.4958186