Title :
Dedicated process architecture and the characteristics of 1.4 μm pixel CMOS image sensor with 8M density
Author :
Chang-Rok Moon ; Jong-Cheol Shin ; Jinho Kim ; Yun Ki Lee ; Young-Joon Cho ; Yu-Yeon Yu ; Seong-Ho Hwang ; Byung Jun Park ; Hwang-Yoon Kim ; Seok-Ha Lee ; Jongwan Jung ; Seong-Ho Cho ; Kangbok Lee ; Kwangok Koh ; Duckhyung Lee ; Kinam Kim
Author_Institution :
Samsung Electron. Co., Yongin
Abstract :
A 1.4 μm-pitch pixel of CMOS image sensor, which is the smallest to date, has been successfully developed and integrated into 8M density for the first time. To overcome the crucial degradation of the saturation charge and sensitivity, a novel photodiode structure extended under transfer gate and an elaborate optical design including very thin tungsten pixel routing with 65 nm-grade design rules are introduced, which result in enhanced electrical and optical performance.
Keywords :
CMOS image sensors; photodiodes; 8M density; CMOS image sensor; photodiode structure; saturation charge; transfer gate; tungsten pixel; CMOS image sensors; Paper technology; Pixel; Very large scale integration;
Conference_Titel :
VLSI Technology, 2007 IEEE Symposium on
Conference_Location :
Kyoto
Print_ISBN :
978-4-900784-03-1
DOI :
10.1109/VLSIT.2007.4339728