Title :
Development of ECR sheet plasma source for ion-enhanced reactive sputter deposition
Author :
Wakatsuchi, M. ; Ishii, S. ; Kato, Y. ; Sunagawa, M. ; Tani, F.
Author_Institution :
Dept. of Electron. & Inf., Toyama Prefectural Univ., Japan
Abstract :
An ECR plasma source is developed to generate rectilinearly uniform plasmas 20 cm in width. The source consists of a pair of permanent magnets and a slot antenna (slotted waveguide). The poles of the magnets face oppositely each other and a line cusp field is generated in a vacuum chamber. The antenna is set in between the magnets. Uniform O2 plasmas are obtained in the range of 20 cm. The source is combined with a magnetron sputtering cathode and applies to ion-enhanced reactive sputtering deposition. Films of TiO2 are deposited for optical coatings. Refractive index of 2.5 is obtained by reactive sputtering in the oxygen ECR plasma. The deposition rate increased by a factor of four with O2/Ar mixing gas
Keywords :
optical films; plasma deposition; plasma production; refractive index; sputter deposition; titanium compounds; 20 cm; ECR sheet plasma source; O2; TiO2; TiO2 film; ion-enhanced reactive sputter deposition; line cusp field; magnetron sputtering cathode; optical coating; permanent magnet; refractive index; slot antenna; slotted waveguide; Cathodes; Optical films; Optical mixing; Optical refraction; Optical waveguides; Permanent magnets; Plasma sources; Plasma waves; Slot antennas; Sputtering;
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
DOI :
10.1109/IIT.1996.586582
