Title :
Realization of high aspect ratio nanopillar type photonic crystal by deep reactive ion etching
Author :
Teo, H.G. ; Yu, M.B. ; Singh, J. ; Ranga, N. ; Li, J. ; Yew, W.C. ; Liu, A.Q.
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
Abstract :
In this paper realization of high aspect ratio nanopillar type photonic crystal by deep reactive ion etching. Sidewall scallops that determines the roughness on the nanopillars were also investigated for the different height and depths obtained through varying process parameters.
Keywords :
nanostructured materials; photonic band gap; photonic crystals; sputter etching; aspect ratio; deep reactive ion etching; nanopillars roughness; photonic crystal; process parameters; sidewall scallops; Circuits; Etching; Fabrication; Frequency; Lattices; Nanostructures; Optical control; Optical devices; Photonic band gap; Photonic crystals;
Conference_Titel :
Biophotonics/Optical Interconnects and VLSI Photonics/WBM Microcavities, 2004 Digest of the LEOS Summer Topical Meetings
Print_ISBN :
0-7803-8306-0
DOI :
10.1109/LEOSST.2004.1338718
