DocumentCode :
3489434
Title :
Receiving and Researching Electrical and Physical Properties of Amorphous Superlattices with Quantum Dots Based on SIXC1-X : H / NC-SI : H
Author :
Nefedov, D.V. ; Yafarov, R.K.
Author_Institution :
Inst. of Radioeng. & Electron., Russian Acad. of Sci., Saratov
fYear :
2006
fDate :
20-21 Sept. 2006
Firstpage :
339
Lastpage :
345
Abstract :
Investigated conditions of receiving nanodimensions crystallites of silicon in microwave plasma of gas discharge of low pressure on noncrystallite substrate with different types of interaction on interphase board. As shown, their formation occurs by infill gaps of initial relief of surface substrate. Established that insertion particles of silicon nanocrystallites in amorphous silicon carbide matrix influence on photoelectric properties received multilayers heterostructures and possess properties of electric active multielectronic centers
Keywords :
amorphous semiconductors; nanostructured materials; nitrogen compounds; photoelectricity; quantum dots; semiconductor superlattices; silicon compounds; NC-Si:H; SixC1-x:H; active multielectronic centers; amorphous silicon carbide matrix; amorphous superlattices; electrical properties; gas discharge; interphase board; microwave plasma; noncrystallite substrate; photoelectric properties; physical properties; quantum dots; silicon crystallites; Amorphous materials; Crystallization; Discharges; Helium; Indium tin oxide; Plasma properties; Quantum dots; Silicon; Superlattices; US Department of Transportation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Actual Problems of Electron Devices Engineering, International Conference on
Conference_Location :
Saratov
Print_ISBN :
1-4244-0246-8
Electronic_ISBN :
1-4244-0247-6
Type :
conf
DOI :
10.1109/APEDE.2006.307435
Filename :
4099649
Link To Document :
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