Coupled-line RF MEMS filters for millimeter-wave applications

Author

Lucyszyn, Stepan ; Miyaguchi, Kenichi ; Robertson, Ian D. ; Jiang, Hong W.

Author_Institution

Dept. of Electr. & Electron. Eng., Imperial Coll. London, London

fYear

2008

fDate

16-20 Dec. 2008

Firstpage

1

Lastpage

4

Abstract

When compared to traditional approaches for implementing millimeter-wave filters, intended for silicon integration, the use of CPW, conventional-microstrip and TFMS lead to unacceptably high losses. This paper has described a novel silicon micromachined RF-coupled cantilever inverted-microstrip millimeter-wave filter technology. Here, low insertion losses have been demonstrated with 3rd order filter implementations, designed for operation at 60 GHz and 76.5 GHz. From this work, it is believed that the technology proposed can be adapted for tunable RF MEMS applications.

Keywords

cantilevers; coplanar waveguides; elemental semiconductors; micromachining; millimetre wave filters; silicon; 3rd order filter; CPW; Si; coupled-line RF MEMS filters; frequency 60 GHz; frequency 76.5 GHz; low insertion losses; millimeter-wave filters; silicon micromachined RF-coupled cantilever; Feeds; Insertion loss; Loss measurement; Microwave filters; Microwave theory and techniques; Millimeter wave measurements; Millimeter wave technology; Radiofrequency microelectromechanical systems; Silicon; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Microwave Conference, 2008. APMC 2008. Asia-Pacific

Conference_Location

Macau

Print_ISBN

978-1-4244-2641-6

Electronic_ISBN

978-1-4244-2642-3

Type

conf

DOI

10.1109/APMC.2008.4958440

Filename

4958440