DocumentCode
3489471
Title
Investigation Model of Multipurpose Technological Device for Vacuum Plasma Treatment Thin Films Deposited on Band Substrate
Author
Generalova, T.B. ; Yafarov, R.K.
Author_Institution
Inst. of Radioeng. & Electron., Russian Acad. of Sci., Saratov
fYear
2006
fDate
20-21 Sept. 2006
Firstpage
345
Lastpage
348
Abstract
Designed, made and researched model of multipurpose technological device for vacuum plasma treatment thin films deposited on band substrate. Calculated and made antenna provided satisfactory agreement with chamber at three loads: 1) chamber without treatment details; 2) chamber with high absorption insulator; and 3) chamber with insulator covered metal
Keywords
plasma deposition; thin films; vacuum deposition; band substrate; high absorption insulator; insulator covered metal; multipurpose technological device; thin films deposition; vacuum plasma treatment thin films; Absorption; Insulation; Loaded antennas; Metal-insulator structures; Plasma devices; Sputtering; Thin film devices; Vacuum technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Actual Problems of Electron Devices Engineering, International Conference on
Conference_Location
Saratov
Print_ISBN
1-4244-0246-8
Electronic_ISBN
1-4244-0247-6
Type
conf
DOI
10.1109/APEDE.2006.307436
Filename
4099650
Link To Document