DocumentCode
3489497
Title
RF MEMS activities at IMETU
Author
Liu, Zewen ; Hou, Zhihao ; Li, Zhijian
Author_Institution
Inst. of Microelectron., Tsinghua Univ., Beijing
fYear
2008
fDate
16-20 Dec. 2008
Firstpage
1
Lastpage
4
Abstract
The research activities on RF-MEMS devices at IMETU (Institute of Microelectronics of Tsinghua University) are presented in this paper. The RF MEMS devices investigated include micro-machined inductors, switches, voltage controlled capacitors. The recent research focus is RF-MEMS switches. Two recently developed DC-contact switches are demonstrated, one is with series configuration and another is shunt. The two types of RF MEMS switch base on the same fabrication process. Borofloattrade glass was used as substrate and a special electroplating process is used to realize the low stress bridge membrane, which assure not only the possible power handling but also a low contact resistance. High performance switches with low insertion loss and high isolation have been obtained with very long life cycle more than 100M times. The S parameters characterization shows the DC-contact series RF MEMS switch is suitable for the application of frequency range from DC to 20 GHz, and the DC-contact shunt RF MEMS switch is suitable for the application of frequency range from DC to 30 GHz.
Keywords
S-parameters; contact resistance; electroplating; microswitches; microwave switches; Borofloat glass; DC-contact series RF MEMS switch; DC-contact shunt RF MEMS switch; IMETU; Institute of Microelectronics of Tsinghua University; RF-MEMS device; S parameter characterization; electroplating process; low contact resistance; low stress bridge membrane; micromachined inductor; microswitch; voltage controlled capacitor; Capacitors; Fabrication; Frequency; Glass; Inductors; Microelectronics; Radiofrequency microelectromechanical systems; Shunt (electrical); Switches; Voltage control;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 2008. APMC 2008. Asia-Pacific
Conference_Location
Macau
Print_ISBN
978-1-4244-2641-6
Electronic_ISBN
978-1-4244-2642-3
Type
conf
DOI
10.1109/APMC.2008.4958442
Filename
4958442
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