Title :
Dependence of dielectric charging on film thickness and deposition conditions
Author :
Daigler, Richard ; Papandreou, Eleni ; Tavassolian, Negar ; Koutsoureli, Matroni ; Papaioannou, George ; Papapolymerou, Ioannis
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA
Abstract :
The electrical properties of thin film SiNx that has been deposited with PECVD method at 150°C and 250°C are investigated on evaporated and electroplated Au substrates. The aim is to extract the parameters that can be introduced in modeling and simulation tools for MEMS design. The present work provides information on the dielectric charging and its dependence on the film thickness, the deposition conditions, the substrate roughness and metallic contacts.
Keywords :
dielectric thin films; plasma CVD; silicon compounds; Au; PECVD; SiNx; deposition conditions; dielectric charging; electrical properties; electroplated substrate; evaporated substrate; film thickness; metallic contacts; substrate roughness; temperature 150 degC; temperature 250 degC; thin film; Dielectric films; Dielectric materials; Dielectric substrates; Dielectric thin films; MIM capacitors; Micromechanical devices; Rough surfaces; Surface charging; Surface roughness; Temperature;
Conference_Titel :
Microwave Conference, 2008. APMC 2008. Asia-Pacific
Conference_Location :
Macau
Print_ISBN :
978-1-4244-2641-6
Electronic_ISBN :
978-1-4244-2642-3
DOI :
10.1109/APMC.2008.4958446
