DocumentCode :
3489816
Title :
High efficiency embedded decoupling capacitors for MCM applications
Author :
Tesson, O. ; Le Cornec, F. ; Jacqueline, S.
Author_Institution :
NXP Semicond., Caen
fYear :
2008
fDate :
15-19 Sept. 2008
Firstpage :
262
Lastpage :
265
Abstract :
In this paper, RF characterization results of decoupling capacitors embedded in high resistivity silicon (HRS) substrate are reported. First, an innovative 3-D architecture suitable for silicon processes is decribed. Then, RF characterization results are analyzed based on capacitance values as well as ESR (estimated serial resistance) and ESL (estimated serial inductance) extraction. Results clearly show that devices reach a very low level of impedance together with low parasitic inductance in millimeter wave domain. A predictive electrical model composed of a cascade of T elements is derived from measurements and optimised to figure-out the distributed nature of the capacitance. Correlations between measurements and simulation data are found satisfactory.
Keywords :
MOS capacitors; electrical resistivity; elemental semiconductors; inductance; silicon; MCM applications; RF characterization; Si; capacitance; decoupling capacitors; estimated serial inductance; estimated serial resistance; high efficiency embedded decoupling capacitors; high resistivity silicon substrate; Capacitors; Conductivity; Electric resistance; Impedance; Inductance; Millimeter wave measurements; Paramagnetic resonance; Parasitic capacitance; Radio frequency; Silicon; Capacitors; Deep Reactive Ion-Etching (DRIE); Device architecture; Integration of Passive Devices (IPD); Multi-Chip Module (MCM); RF characterization; modelling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2008. ESSDERC 2008. 38th European
Conference_Location :
Edinburgh
ISSN :
1930-8876
Print_ISBN :
978-1-4244-2363-7
Electronic_ISBN :
1930-8876
Type :
conf
DOI :
10.1109/ESSDERC.2008.4681748
Filename :
4681748
Link To Document :
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