DocumentCode
3489934
Title
Advancement in cermet thick film technology for dry circuit applications
Author
Bolin, R.M. ; Bosze, Wayne P.
Author_Institution
Bourns Inc., Riverside, CA, USA
fYear
1988
fDate
26-29 Sept. 1988
Firstpage
251
Lastpage
255
Abstract
The primary limiting factor of the variable resistors presently available for operation in the low microampere range is output instability as a result of changes in contact resistance. These changes result from nonconductive films and dielectrics forming over time between the resistor element and wiper contact. The authors discuss a novel cermet technology that greatly reduces the effects of contact resistance, namely, recently developed Palirium system that improves output stability by creating a precious metal to metal contact point between the resistor´s element and the wiper.<>
Keywords
cermets; contact resistance; electrical contacts; potentiometers; stability; thick film resistors; Palirium system; cermet thick film technology; changes in contact resistance; contact resistance stability; dielectrics forming over time; dry circuit applications; low microampere range; nonconductive films; novel cermet technology; operation; output instability; output stability; precious metal to metal contact; primary limiting factor; resistor element; variable resistors; wiper contact; wiper resistor element contacts; Ceramics; Circuit stability; Contact resistance; Dielectric films; Impedance; Integrated circuit technology; Resistors; Thick film circuits; Thick films; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical Contacts, 1988., Proceedings of the Thirty Fourth Meeting of the IEEE Holm Conference on
Conference_Location
San Francisco, CA, USA
Type
conf
DOI
10.1109/HOLM.1988.16125
Filename
16125
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