• DocumentCode
    3490582
  • Title

    Simulation of migration effects in PoP

  • Author

    Weide-Zaage, K. ; Fremont, H. ; Linyan Wang

  • Author_Institution
    Lab. fur Informationstechnologie, Univ. of Hannover, Hannover
  • fYear
    2008
  • fDate
    20-23 April 2008
  • Firstpage
    1
  • Lastpage
    7
  • Abstract
    Due to miniaturisation, higher performance and higher integration, the width of conductive lines as well as the diameter of the solder joints decreases; 3-dimensional packaging like "package-on-package" (PoP) is used in compact applications. The density of solder bumps increases, while pitches become finer. This may lead to an increase of the current density in the solder bump. At present for these packages only finite-element-simulations concerning the warpage were carried out. For the characterisation of PoP reliability, the migration behaviour of the bumps as well as the traces in the substrate were investigated by finite element simulations. The purpose of this paper is an investigation of the via fill in, ambient temperature, reference temperature of the stress free state as well as the influence of delamination in the interconnections of the PoPs before degradation out of migration effects occur, to find out possible risk for PoPs with smaller bumps and traces.
  • Keywords
    finite element analysis; semiconductor device packaging; substrates; 3D packaging; PoP reliability; conductive lines; finite element simulations; package-on-package; solder bumps; solder joints; substrates; Copper; Current density; Delamination; Energy consumption; Finite element methods; Lead; Material properties; Packaging; Stress; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems, 2008. EuroSimE 2008. International Conference on
  • Conference_Location
    Freiburg im Breisgau
  • Print_ISBN
    978-1-4244-2127-5
  • Electronic_ISBN
    978-1-4244-2128-2
  • Type

    conf

  • DOI
    10.1109/ESIME.2008.4525074
  • Filename
    4525074