DocumentCode :
3490646
Title :
Assessment of the feasibility of ‘multiple chips-to-wafer’ thermo-compression bonding using FEM
Author :
Okoro, C. ; Jourdain, A. ; Vandevelde, B. ; Swinnen, B. ; Vandepitte, D.
Author_Institution :
IMEC, Leuven
fYear :
2008
fDate :
20-23 April 2008
Firstpage :
1
Lastpage :
5
Abstract :
In this work FEM is used to conduct a parametric study of the chip-to-wafer thermo-compression bonding process. It is found that the main cause of pressure non- uniformity across stacked chips is due to die-thickness-variation (DTV) resulting from wafer thinning process. The use of a compliant pad is necessary to reduce non-uniform pressure across stacked chips. A compliant pad thickness of about 2.5 - 3 mm is observed to be the optimal thickness for a minimal non-uniformity in pressure at the Cu-Cu interface for a one-level die-stack having a maximum stack thickness of 700 mum. Stress concentrations were found to occur at the edges of the chip, but were minimal and are not expected to result in chip fracture/cracking.
Keywords :
finite element analysis; tape automated bonding; FEM; die-thickness-variation; multiple chips-to-wafer; thermo-compression bonding; wafer thinning; Bonding forces; Bonding processes; Contacts; Nails; Parametric study; Polymers; Semiconductor device modeling; Stacking; Temperature; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems, 2008. EuroSimE 2008. International Conference on
Conference_Location :
Freiburg im Breisgau
Print_ISBN :
978-1-4244-2127-5
Electronic_ISBN :
978-1-4244-2128-2
Type :
conf
DOI :
10.1109/ESIME.2008.4525080
Filename :
4525080
Link To Document :
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