• DocumentCode
    3490646
  • Title

    Assessment of the feasibility of ‘multiple chips-to-wafer’ thermo-compression bonding using FEM

  • Author

    Okoro, C. ; Jourdain, A. ; Vandevelde, B. ; Swinnen, B. ; Vandepitte, D.

  • Author_Institution
    IMEC, Leuven
  • fYear
    2008
  • fDate
    20-23 April 2008
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    In this work FEM is used to conduct a parametric study of the chip-to-wafer thermo-compression bonding process. It is found that the main cause of pressure non- uniformity across stacked chips is due to die-thickness-variation (DTV) resulting from wafer thinning process. The use of a compliant pad is necessary to reduce non-uniform pressure across stacked chips. A compliant pad thickness of about 2.5 - 3 mm is observed to be the optimal thickness for a minimal non-uniformity in pressure at the Cu-Cu interface for a one-level die-stack having a maximum stack thickness of 700 mum. Stress concentrations were found to occur at the edges of the chip, but were minimal and are not expected to result in chip fracture/cracking.
  • Keywords
    finite element analysis; tape automated bonding; FEM; die-thickness-variation; multiple chips-to-wafer; thermo-compression bonding; wafer thinning; Bonding forces; Bonding processes; Contacts; Nails; Parametric study; Polymers; Semiconductor device modeling; Stacking; Temperature; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems, 2008. EuroSimE 2008. International Conference on
  • Conference_Location
    Freiburg im Breisgau
  • Print_ISBN
    978-1-4244-2127-5
  • Electronic_ISBN
    978-1-4244-2128-2
  • Type

    conf

  • DOI
    10.1109/ESIME.2008.4525080
  • Filename
    4525080