DocumentCode :
3491205
Title :
Fabrication and testing of 980nm high-power VCSEL with AlN film passivation layer
Author :
Hou, Lifeng ; Ma, Yongfeng ; Feng, Yuan
Author_Institution :
Dept. of Electron. Eng., Changchun Eng. Tech. Inst. Changchun, Changchun, China
fYear :
2012
fDate :
23-25 Aug. 2012
Firstpage :
45
Lastpage :
48
Abstract :
We report the fabrication and the testing of a novel high-power VCSEL with AlN film passivation layer in this paper. The analysis on the high-power VCSEL show that the AlN film passivation layer can improve the opto-electric characteristics of high-power VCSEL, reduce the thermal resistance of VCSEL and enhance the ability of the heat dissipation; The AlN film passivation layer and the SiO2 film passivation layer high-power VCSEL both with the same aperture have been made by the same processes on the same epitaxial wafer; the two kinds of high power VCSEL have been tested comparatively, the testing results show that the out power of the VCSEL on AlN film passivation layer is 470mW at room temperature, its characteristic temperature is 120K, it have the much better temperature and opto-electric characteristics than the device on the SiO2 film passivation layer.
Keywords :
III-V semiconductors; aluminium compounds; cooling; laser beams; laser cavity resonators; optical fabrication; optical testing; passivation; quantum well lasers; semiconductor epitaxial layers; silicon compounds; surface emitting lasers; thermal resistance; wide band gap semiconductors; AlN; SiO2; characteristic temperature; epitaxial wafer; film passivation layer; heat dissipation; high-power VCSEL; laser out power; optical fabrication; optical testing; opto-electric characteristics; power 470 mW; temperature 120 K; temperature 293 K to 298 K; thermal resistance; wavelength 980 nm; Conductivity; Films; Heating; Passivation; Temperature; Threshold current; Vertical cavity surface emitting lasers; AIN; VCSEL; high-power; passivation layer; semiconductorlaser;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronics and Microelectronics (ICOM), 2012 International Conference on
Conference_Location :
Changchun, Jilin
Print_ISBN :
978-1-4673-2638-4
Type :
conf
DOI :
10.1109/ICoOM.2012.6316212
Filename :
6316212
Link To Document :
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