• DocumentCode
    3491330
  • Title

    Improve small capacitance measurement sensitivity by opto-electronic isolation method

  • Author

    Wang, Wei ; Huang, Lu ; Yang, Yan ; Dai, Dongxue ; Sun, Qian ; Xia, Lijiao

  • Author_Institution
    Nat. Inst. of Metrol., Beijing, China
  • fYear
    2010
  • fDate
    13-18 June 2010
  • Firstpage
    430
  • Lastpage
    431
  • Abstract
    The cross capacitor of NIM established in 1970 s is the primary standard of Chinese capacitance traceability system. It has a relative uncertainty of 1 in 107. The value of the capacitor is about 0.5 pF. This small value leads to a low SNR, and the sensitivity of the measurement is about several parts in 108 . An opto-electronic isolating method is designed in this paper, cooperated with a lock-in amplifier, which could improve the capacitance measurement sensitivity to 1 in 108.
  • Keywords
    amplifiers; capacitance measurement; capacitors; Chinese capacitance traceability system; NIM; capacitance measurement sensitivity; cross capacitor; lock-in amplifier; optoelectronic isolation method; Amplifiers; Bridge circuits; Capacitance measurement; Capacitors; Detectors; Frequency; Q factor; RLC circuits; Resonance; Signal detection;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Precision Electromagnetic Measurements (CPEM), 2010 Conference on
  • Conference_Location
    Daejeon
  • Print_ISBN
    978-1-4244-6795-2
  • Type

    conf

  • DOI
    10.1109/CPEM.2010.5545137
  • Filename
    5545137
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3491330