Title :
Silicon wire waveguide crossing with negligible loss and crosstalk
Author_Institution :
Lab. of Opt. Mater. & Struct. Rzhanov Inst. of Semicond. Phys., Novosibirsk, Russia
Abstract :
Current paper introduces efficient silicon wire waveguide crossing by means of vertical coupling of tapered Si wire with upper SU-8 polymer wide strip waveguide through a silica buffer. Numerical 3D simulations by FDTD proves that optimal structure of 70 μm length provided 98% efficiency for through pass and 99.9% efficiency for cross pass as well as negligible back reflection (-50 dB) and cross talk (-70 dB). Proposed waveguide crossing on thin silicon-on-insulator CMOS compatible structures could find multiple applications in photonics.
Keywords :
CMOS integrated circuits; elemental semiconductors; finite difference time-domain analysis; integrated optoelectronics; optical crosstalk; optical losses; optical polymers; optical waveguides; silicon; silicon compounds; silicon-on-insulator; 3D numerical simulations; FDTD simulations; Si; SiO2; back reflection; optical crosstalk; optical loss; optimal structure; photonics applications; silica buffer; silicon wire waveguide crossing; tapered wire; thin silicon-on-insulator CMOS compatible structures; upper SU-8 polymer wide strip waveguide; vertical coupling; Crosstalk; Optical losses; Optical waveguides; Polymers; Silicon; Time-domain analysis; Wires; Silicon-on-insulator; numerical modeling; waveguide crossing;
Conference_Titel :
Actual Problems of Electronics Instrument Engineering (APEIE), 2012 11th International Conference on
Conference_Location :
Novosibirsk
Print_ISBN :
978-1-4673-2842-5
DOI :
10.1109/APEIE.2012.6629024
