DocumentCode :
349253
Title :
Mg diffusion formed p-type GaN
Author :
Yen, Jia-Liang ; Shyang, Fuh ; Yang, Ying-Jay
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume :
1
fYear :
1999
fDate :
1999
Firstpage :
35
Abstract :
Summary form only given. In the development of GaN and related nitride compound, using Mg doping to form a p-type GaN plays a critical role for making green-to-blue light emitting devices. Despite of the progress in the in-situ Mg doping process, the conventional post-growth doping techniques, such as the diffusion process to achieve higher hole concentration for better p-type ohmic contact or device operation, haven´t been successfully demonstrated yet. Also due to the lack of reliable process the diffusion properties of Mg, which may affect the device structure and operation, still remain unknown. In this paper, we report on Mg diffusion into unintentionally doped n-type GaN resulting in p-type GaN formation
Keywords :
III-V semiconductors; diffusion; gallium compounds; light emitting devices; optical fabrication; semiconductor doping; GaN:Mg; Mg diffusion; Mg diffusion formed p-type GaN; diffusion properties; green-to-blue light emitting devices; optical fabrication; p-type GaN formation; post-growth doping techniques; reliable process; semiconductor doping; unintentionally doped n-type GaN; Annealing; Diffusion processes; Doping; Etching; Furnaces; Gallium nitride; Human computer interaction; MOCVD; Ohmic contacts; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
LEOS '99. IEEE Lasers and Electro-Optics Society 1999 12th Annual Meeting
Conference_Location :
San Francisco, CA
ISSN :
1092-8081
Print_ISBN :
0-7803-5634-9
Type :
conf
DOI :
10.1109/LEOS.1999.813463
Filename :
813463
Link To Document :
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