Title :
Microlens fabrication using Cl2/Ar CAIBE optimized by 2 level factorial design of experiments (DOE)
Author :
Yu, J.S. ; Yang, S.K. ; Choo, A.G. ; Kim, T.I.
Author_Institution :
Samsung Adv. Inst. of Technol., Suwon, South Korea
Abstract :
A new microlens fabrication method using Cl2-Ar chemically assisted ion beam etching (CAIBE) was presented. Smooth lens surface and shorter etching time were the main advantages over the conventional Ar ion beam etching (IBE). The optimum etching parameters were determined using 2-level factorial diffractive optical elements (DOE)
Keywords :
argon; chlorine; design of experiments; diffractive optical elements; ion beam assisted deposition; microlenses; optical fabrication; sputter etching; 2 level factorial design of experiments; 2-level factorial diffractive optical elements; Ar ion beam etching; Cl2-Ar; Cl2/Ar CAIBE; Cl2/Ar chemically assisted ion beam etching; etching time; microlens fabrication; optimum etching parameters; smooth lens surface; Argon; Chemicals; Etching; Identity-based encryption; Ion beams; Lenses; Microoptics; Optical device fabrication; Optical diffraction; Particle beam optics;
Conference_Titel :
LEOS '99. IEEE Lasers and Electro-Optics Society 1999 12th Annual Meeting
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-5634-9
DOI :
10.1109/LEOS.1999.813497
