• DocumentCode
    3493099
  • Title

    Selective MOVPE technique and its applications for photonic devices

  • Author

    Sasaki, T.

  • Author_Institution
    Optoelectron. & High-Frequency Device Res. Lab., NEC Corp., Ibaraki, Japan
  • Volume
    3
  • fYear
    1999
  • fDate
    Aug. 30 1999-Sept. 3 1999
  • Firstpage
    1068
  • Abstract
    The selective growth technique on a mask-patterned planar substrate has attracted much attention because it enables simple integration of thickness-tapered waveguides as well as bandgap-energy control in waveguide layers. Moreover, narrow-stripe selective MOVPE enables the formation of active/passive waveguide layers without a mesa-etching process, which is an attractive approach to the fabrication of photonic devices. The paper reviews this technique, and discusses several device applications.
  • Keywords
    MOCVD; energy gap; optical fabrication; optical planar waveguides; optical waveguide components; reviews; vapour phase epitaxial growth; active/passive waveguide layers; bandgap-energy control; device applications; fabrication; mask-patterned planar substrate; narrow-stripe selective MOVPE; photonic devices; reviews; selective MOVPE technique; selective growth technique; simple integration; thickness-tapered waveguides; waveguide layers; Electrons; Epitaxial growth; Epitaxial layers; Optical device fabrication; Optical modulation; Optical surface waves; Optical waveguides; Planar waveguides; Quantum well devices; Thickness control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on
  • Conference_Location
    Seoul, South Korea
  • Print_ISBN
    0-7803-5661-6
  • Type

    conf

  • DOI
    10.1109/CLEOPR.1999.817975
  • Filename
    817975