DocumentCode :
3493488
Title :
Monte-Carlo Simulation of Decananometric Double-Gate SOI devices: Multi-Subband vs. 3D-Electron Gas with Quantum Corrections
Author :
Riolino, I. ; Braccioli, M. ; Lucci, L. ; Esseni, D. ; Fiegna, C. ; Palestri, P. ; Selmi, L.
Author_Institution :
DIEGM, Udine Univ.
fYear :
2006
fDate :
Sept. 2006
Firstpage :
162
Lastpage :
165
Abstract :
In this paper, two Monte-Carlo simulators implementing different models of the influence of carrier quantization on the electrostatics and transport are applied to sub-100nm double-gate SOI devices. To this purpose a new stable and efficient scheme to implement the contacts in the simulation of DG SOI devices is introduced first. Then, results in terms of drain current and microscopic quantities are compared, providing a comparison between a well assessed semiclassical tool and a more rigorous multi-subband code
Keywords :
MOSFET; Monte Carlo methods; carrier mobility; electrostatics; semiconductor device models; silicon-on-insulator; 3D-electron gas; Monte-Carlo simulation; carrier quantization; carrier transport; decananometric double-gate SOI; electrostatics; multi-subband code; quantum corrections; semiclassical tool; sub-100nm SOI device; Effective mass; Electrons; Electrostatics; MOSFETs; Particle scattering; Poisson equations; Quantization; Semiconductor films; Silicon; Strontium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2006. ESSDERC 2006. Proceeding of the 36th European
Conference_Location :
Montreux
ISSN :
1930-8876
Print_ISBN :
1-4244-0301-4
Type :
conf
DOI :
10.1109/ESSDER.2006.307663
Filename :
4099881
Link To Document :
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