DocumentCode
3493630
Title
High Quality Factor Copper Inductors on Wafer-Level Quartz Package for RF MEMS Applications
Author
Leroy, Christine ; Pisani, Marcelo B. ; Fritschi, Raphaël ; Hibert, Cyrille ; Ionescu, Adrian M.
Author_Institution
Electron. Lab., Ecole Polytechnique Federate de Lausanne
fYear
2006
fDate
19-21 Sept. 2006
Firstpage
190
Lastpage
193
Abstract
The paper proposes and validates a new doubly functional quartz wafer-level package concept for MEMS devices. In addition to the mechanical and environment protection, thick-Cu high-Q inductors for RF applications are made within the package processing. A double-side processing of a quartz wafer is reported. While the top side of the quartz is used to realize quartz-embedded horizontal plane Cu inductors, the bottom side is thermo-mechanically bonded on an active wafer using an SU8 photoepoxy semi-hermetic seal. A successful fabrication results in terms of very good adhesion of SU8 bonding, compatibility with fluorine plasma chemistry for MEMS release and very good RF performances (excellent quality factors, higher than 30 at 2 GHz, and self resonant frequency above 6 GHz) was demonstrated
Keywords
copper; inductors; micromechanical devices; seals (stoppers); silicon compounds; wafer bonding; wafer level packaging; Cu; RF MEMS application; SU8 bonding; SiO2; copper inductors; double-side quartz wafer processing; fluorine plasma chemistry compatibility; high quality factor; high-Q inductors; semi-hermetic seal; thermo-mechanical bond; wafer-level quartz package; Copper; Inductors; Microelectromechanical devices; Packaging; Protection; Q factor; Radio frequency; Radiofrequency microelectromechanical systems; Wafer bonding; Wafer scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2006. ESSDERC 2006. Proceeding of the 36th European
Conference_Location
Montreux
ISSN
1930-8876
Print_ISBN
1-4244-0301-4
Type
conf
DOI
10.1109/ESSDER.2006.307670
Filename
4099888
Link To Document