DocumentCode :
3494568
Title :
High Threshold Voltage Matching Performance on Gate-All-Around MOSFET
Author :
Cathignol, Augustin ; Cros, Antoine ; Harrison, Samuel ; Cerrutti, Robin ; Coronel, Philippe ; Pouydebasque, Arnaud ; Rochereau, Krysten ; Skotnicki, Thomas ; Ghibaudo, Gérard
Author_Institution :
STMicroelectronics, Crolles
fYear :
2006
fDate :
Sept. 2006
Firstpage :
379
Lastpage :
382
Abstract :
For the first time, threshold voltage matching was measured on multiple gate transistors, and particularly on n-channel gate-all-around transistors (GAA) with both doped and undoped channel. Good matching performance is demonstrated on doped channel transistors, thanks to the absence of pocket nor halo implants. But most of all, it is shown that suppressing the channel doping allows to suppress the dopant induced fluctuations contribution and provides an Avt parameter as low as 1.4 mV.mum, which is the best ever reported result on MOS transistors
Keywords :
MOSFET; semiconductor doping; MOS transistors; doped channel transistors; gate-all-around MOSFET; multiple gate transistors; n-channel gate-all-around transistors; threshold voltage matching performance; undoped channel transistors; Doping; Fluctuations; Germanium silicon alloys; MOSFET circuits; Random access memory; Silicon germanium; Stochastic processes; Testing; Threshold voltage; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2006. ESSDERC 2006. Proceeding of the 36th European
Conference_Location :
Montreux
ISSN :
1930-8876
Print_ISBN :
1-4244-0301-4
Type :
conf
DOI :
10.1109/ESSDER.2006.307717
Filename :
4099935
Link To Document :
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