DocumentCode
3494606
Title
Low threshold current GaAs/InGaAs vertical-cavity surface-emitting laser grown at a constant temperature by molecular beam epitaxy
Author
Li, C.Y. ; Zhang, D.H. ; Yoon, S.F.
Author_Institution
Sch. of Electr. & Electron. Eng., Nanyang Technol. Inst., Singapore
fYear
1996
fDate
26-28 Nov 1996
Firstpage
164
Lastpage
167
Abstract
We report successful growth of low threshold current GaAs/InGaAs vertical cavity surface emitting lasers (VCSELs) by molecular beam epitaxy (MBE) at a constant temperature which is carefully selected in order not to deteriorate the quality of InGaAs and AlGas. The most important advantage of such constant temperature growth is the precise control of the thickness of each layer for the whole structure by using an infrared thermometer. It is demonstrated that the threshold current of our samples, patterned 15×15 μm2, at room temperature continuous wave operation is 700 μA and the maximum output power is about 800 μW at a lasing wavelength of 945 nm
Keywords
III-V semiconductors; gallium arsenide; indium compounds; molecular beam epitaxial growth; quantum well lasers; reflectivity; semiconductor growth; surface emitting lasers; thickness control; 560 C; 700 muA; 800 muW; 945 nm; GaAs-InGaAs; GaAs/InGaAs vertical-cavity surface-emitting laser; MBE; VCSEL; constant temperature growth; infrared thermometer; lasing wavelength; low threshold current; maximum output power; reflectivity spectrum; room temperature continuous wave operation; thickness control; Distributed Bragg reflectors; Gallium arsenide; Indium gallium arsenide; Molecular beam epitaxial growth; Monitoring; Optical surface waves; Surface emitting lasers; Temperature; Threshold current; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Electronics, 1996. ICSE '96. Proceedings., 1996 IEEE International Conference on
Conference_Location
Penang
Print_ISBN
0-7803-3388-8
Type
conf
DOI
10.1109/SMELEC.1996.616475
Filename
616475
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