Simultaneous ion beam deposition of positive and negative ions for the production of Au-N systems

Author

Heck, Claire ; Tsubouchi, Nobuteru ; Chayahara, Akiyoshi ; Horino, Yuji ; Iwani, M.

Author_Institution

AIST, Osaka Nat. Res. Inst., Japan

Volume

2

fYear

1999

fDate

36495

Firstpage

893

Abstract

A new material production method, using ion beam deposition (IBD), has been applied for the simultaneous deposition of positive and negative ions of a variety of materials. This method combines the use of clean ion sources with mass-analyzed ion beams under ultra-high-vacuum conditions, to allow the production of ultra clean materials. Studies were performed in order to clarify the composition and morphology of Au films produced by the deposition of negative Au simultaneously with positive N ions on glassy C substrates. Depositions were made with different ion beam energies, to study the influence of energy on the composition of the films. Analyses were preformed with X-ray photoelectron spectroscopy and high resolution scanning electron microscopy

Keywords

X-ray photoelectron spectra; gold; ion beam applications; metallic thin films; nitrogen; scanning electron microscopy; Au; AuN; C; X-ray photoelectron spectroscopy; clean ion sources; film composition; film morphology; glassy C substrates; high resolution SEM; ion beam deposition; mass-analyzed ion beams; negative ions; positive ions; ultra clean materials; ultra-high-vacuum; Electron beams; Energy resolution; Gold; Ion beams; Ion sources; Magnetic analysis; Morphology; Production systems; Scanning electron microscopy; Spectroscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology Proceedings, 1998 International Conference on

Conference_Location

Kyoto

Print_ISBN

0-7803-4538-X

Type

conf

DOI

10.1109/IIT.1998.813812

Filename

813812