Title :
Synthesis of CeO2 films by ion beam assisted deposition
Author :
Shimizu, I. ; Kumagai, M. ; Saito, H. ; Setsuhara, Y. ; Makino, Y. ; Miyake, S.
Author_Institution :
Joining & Welding Res. Inst., Osaka Univ., Japan
Abstract :
Cerium oxide (CeO2) films were prepared by ion beam assisted deposition(IBAD). The films were synthesized on Si wafers by depositing CeO2 vapor under simultaneous bombardment with oxygen ions in the energy range of 1.0-4.0 keV. Film characterizations were performed by X-ray diffractometry for structural analysis, Rutherford backscattering spectrometry for film composition and the packing density measurements, ellipsometry for refractive index measurements and field-emission type scanning electron microscopy for cross sectional observation of film morphology. With increasing ion energy and/or ion-to-CeO2 vapor transport ratio, film crystallization was enhanced; preferential orientation shifted from (111) to (220), and the morphology changed from the columnar grains to the granular. The increase in the transport ratio (O+/CeO2) also revealed significant enhancement on the film packing density, leading to the increase in the refractive index
Keywords :
Rutherford backscattering; cerium compounds; crystal microstructure; ellipsometry; grain size; insulating thin films; ion beam assisted deposition; refractive index; 1 to 4 keV; CeO2; CeO2 films; Rutherford backscattering spectrometry; X-ray diffractometry; columnar grains; cross sectional observation; ellipsometry; field-emission type scanning electron microscopy; film characterization; film composition; film crystallization; film morphology; granular; ion beam assisted deposition; ion-to-CeO2 vapor transport ratio; morphology; packing density measurements; preferential orientation; refractive index; refractive index measurements; structural analysis; Cerium; Density measurement; Ion beams; Morphology; Optical films; Performance analysis; Performance evaluation; Refractive index; Semiconductor films; X-ray diffraction;
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
DOI :
10.1109/IIT.1998.813833