Title : 
Growth of perylene pigment thin films using an ionized cluster beam method and its application to photocurrent multiplication devices
         
        
            Author : 
Sano, Ken-Ichi ; Watanabe, Masanori ; Takagi, Toshinori
         
        
            Author_Institution : 
Ion Eng. Res. Inst. Corp., Osaka, Japan
         
        
        
        
        
        
            Abstract : 
A basic technique to control the growth morphology and crystal structure of thin films of a perylene pigment, N,N´ dimethylperylene-3,4:9,10-bis-dicarboximide (Me-PTC), using an ionized cluster beam (ICB) method has been developed. We deposited Me-PTC films on ITO coated glass substrates. The growth plane of Me-PTC film was found to change with deposition temperatures from (102) to (002), which corresponded to the parallel and the standing orientations of Me-PTC molecules, respectively. The optimum crystallinity was obtained at an accelerating voltage of the ICE (Va) of 300 V. We prepared specimens using this technique to evaluate the fundamental photocurrent multiplication effect (PME) in Me-PTC. The optimum operating temperature for the PME was found to be controlled by changing Va. A quantum efficiency of 12,500 in the PME can be attained at at room temperature, in the specimens prepared at a V, of 200 V. The ion assisted growth mechanisms of Me-PTC films, as well as the mechanism of the PME, are also discussed
         
        
            Keywords : 
ionised cluster beam deposition; organic compounds; organic semiconductors; semiconductor growth; semiconductor thin films; N,N´ dimethylperylene-3,4:9,10-bis-dicarboximide; crystal structure; growth morphology; growth plane; ionized cluster beam method; optimum crystallinity; perylene pigment thin films; photocurrent multiplication devices; Acceleration; Crystallization; Glass; Indium tin oxide; Ion beams; Morphology; Pigmentation; Substrates; Temperature; Transistors;
         
        
        
        
            Conference_Titel : 
Ion Implantation Technology Proceedings, 1998 International Conference on
         
        
            Conference_Location : 
Kyoto
         
        
            Print_ISBN : 
0-7803-4538-X
         
        
        
            DOI : 
10.1109/IIT.1998.813847