Title :
Adhesion improvement between metal thin films (Cu and Pt) and high surface free energy polyimide by ion assisted reaction
Author :
Choi, Sung-Chang ; Koh, Seok-Keun
Author_Institution :
Thin Film Technol. Res. Center, Korea Inst. of Sci. & Technol., Seoul, South Korea
Abstract :
Adhesions between metal films (Cu and Pt) and polyimide substrate were enhanced by ion assisted reaction using low energy ion beams (~1 kV) in oxygen gas environments. In the ion assisted reaction process, ion dose and blown gas flow rate were changed from 5×1014 to 1×1017 ions/cm2 and from 0 to 8 sccm, respectively. Surface free energy of polyimide film increased from 46 to 72 dyne/cm2 by ion assisted reaction. The modified polyimide surface was observed by scanning electron microscopy and X-ray photoelectron spectroscopy, and electronegative groups such as C-O and C=O were formed on the polyimide surface without surface damage. Adhesion enhancement between metal films and polyimide modified by ion assisted reaction was confirmed by a peel test using scotch tape and a boiling test
Keywords :
X-ray photoelectron spectra; adhesion; copper; ion beam applications; metallic thin films; platinum; polymer films; scanning electron microscopy; surface energy; Cu; Pt; X-ray photoelectron spectroscopy; adhesion; boiling test; gas flow rate; ion assisted reaction; ion dose; low energy ion beams; metal thin films; oxygen gas environment; peel test; polyimide; scanning electron microscopy; surface free energy; Adhesives; Fluid flow; Ion beams; Photoelectron microscopy; Polyimides; Scanning electron microscopy; Spectroscopy; Substrates; Testing; Transistors;
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
DOI :
10.1109/IIT.1998.813868