Title :
Negative-ion implanter for powders and uniform implantation without particle scattering
Author :
Tsuji, Hiroshi ; Mimura, Masakazu ; Kido, Shunsuke ; Gotoh, Yasuhito ; Ishikawa, Junzo
Author_Institution :
Dept. of Electron. Sci. & Eng., Kyoto Univ., Japan
Abstract :
A negative-ion implanter was developed for uniform implantation into powders without particle scattering. It consists of a plasma sputter-type negative-ion source, a mass-separator, a transport system, and a Faraday cup with an agitator. The agitator of the electromagnetic vibrator at a frequency of 120 Hz mixes particles for whole surface treatment and uniform implantation. In this implanter, there was no scattering observed in any kinds of powders for a size of 5 to 1,000 μm at agitation as well as in a stationary state with no external charge compensator. Depth profiles of implanted atoms in a sphere glass during agitation was measured by SIMS and calculated as compared to that in a flat plate. Besides, the uniformity of implanted atoms among particles was evaluated from the results of XPS
Keywords :
X-ray photoelectron spectra; doping profiles; glass; ion implantation; ion sources; powders; secondary ion mass spectra; surface treatment; 5 to 1000 mum; Faraday cup; SIMS; agitator; depth profiles; electromagnetic vibrator; mass-separator; negative-ion implanter; particle scattering; plasma sputter-type negative-ion source; powders; sphere glass; surface treatment; transport system; uniform implantation; Atomic measurements; Electromagnetic scattering; Frequency; Glass; Particle scattering; Plasma sources; Plasma transport processes; Powders; Stationary state; Surface treatment;
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
DOI :
10.1109/IIT.1998.813899
