DocumentCode
3495571
Title
A room temperature, zero force, wafer-level attachment method for MEMS integration
Author
Beker, Levent ; Zorlu, Ozge ; Kulah, Haluk
Author_Institution
METU MEMS Center, Middle East Tech. Univ. (METU), Ankara, Turkey
fYear
2013
fDate
20-24 Jan. 2013
Firstpage
267
Lastpage
270
Abstract
This paper presents a wafer level attachment method for handling various shaped structures for MEMS processes, using parylene as an interlayer material. In this method, a handle wafer containing pillars and perforations is utilized, and structures are attached to the handle wafer through a parylene coating process realized at room temperature with no applied force. It is observed that pillars with 20 μm height, 2.5 mm side length, and 4.5 mm spacing can successfully be used to attach two 4" substrates to each other. The shear strength between the attached substrates is measured as 0.49 MPa, proving the feasibility of the method for integrating various materials into MEMS processes.
Keywords
CVD coatings; micromechanical devices; shear strength; MEMS integration; MEMS process; handle wafer; interlayer material; parylene coating process; perforations; pillars; room temperature; shear strength; wafer-level attachment method; zero force; Bonding; Coatings; Force; Micromechanical devices; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems (MEMS), 2013 IEEE 26th International Conference on
Conference_Location
Taipei
ISSN
1084-6999
Print_ISBN
978-1-4673-5654-1
Type
conf
DOI
10.1109/MEMSYS.2013.6474229
Filename
6474229
Link To Document