DocumentCode :
3495571
Title :
A room temperature, zero force, wafer-level attachment method for MEMS integration
Author :
Beker, Levent ; Zorlu, Ozge ; Kulah, Haluk
Author_Institution :
METU MEMS Center, Middle East Tech. Univ. (METU), Ankara, Turkey
fYear :
2013
fDate :
20-24 Jan. 2013
Firstpage :
267
Lastpage :
270
Abstract :
This paper presents a wafer level attachment method for handling various shaped structures for MEMS processes, using parylene as an interlayer material. In this method, a handle wafer containing pillars and perforations is utilized, and structures are attached to the handle wafer through a parylene coating process realized at room temperature with no applied force. It is observed that pillars with 20 μm height, 2.5 mm side length, and 4.5 mm spacing can successfully be used to attach two 4" substrates to each other. The shear strength between the attached substrates is measured as 0.49 MPa, proving the feasibility of the method for integrating various materials into MEMS processes.
Keywords :
CVD coatings; micromechanical devices; shear strength; MEMS integration; MEMS process; handle wafer; interlayer material; parylene coating process; perforations; pillars; room temperature; shear strength; wafer-level attachment method; zero force; Bonding; Coatings; Force; Micromechanical devices; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2013 IEEE 26th International Conference on
Conference_Location :
Taipei
ISSN :
1084-6999
Print_ISBN :
978-1-4673-5654-1
Type :
conf
DOI :
10.1109/MEMSYS.2013.6474229
Filename :
6474229
Link To Document :
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