Title :
Vertical continuous flow lithography for fabricating long 3D structures
Author :
Habasaki, S. ; Yoshida, Sigeru ; Lee, W.C. ; Takeuch, S.
Author_Institution :
Inst. of Ind. Sci., Univ. of Tokyo, Tokyo, Japan
Abstract :
We propose an in situ photopolymerization method for three dimensional (3D) microfabrications which we call “Vertical Continuous Flow Lithography” (VCFL). We used a digital micromirror device (DMD) as a dynamic photomask and a vertical flow of polyethylene glycol diacrylate (PEGDA) in a microchannel. VCFL can not only fabricate long (~5 mm) structures but also control 3D geometries of structures. We experimentally demonstrated the fabrication of long fibers whose cross-sectional (diameters and shapes) geometries could be controlled. We believe that VCFL will be useful in bottom up tissue engineering to make long complex structures, such as branched blood vessels.
Keywords :
masks; microfabrication; micromirrors; photolithography; 3D structure geometries; DMD; PEGDA vertical flow; VCFL; bottom up tissue engineering; branched blood vessels; cross-sectional geometries; digital micromirror device; dynamic photomask; in situ photopolymerization method; long-3D structure fabrication; polyethylene glycol diacrylate vertical flow; three-dimensional microfabrications; vertical continuous flow lithography; Fabrication; Geometry; Lithography; Microchannel; Optical fiber devices; Polymers; Shape;
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2013 IEEE 26th International Conference on
Conference_Location :
Taipei
Print_ISBN :
978-1-4673-5654-1
DOI :
10.1109/MEMSYS.2013.6474255