• DocumentCode
    3496441
  • Title

    CAD for Photonic Devices and Circuit

  • Author

    Xu, Chenglin

  • Author_Institution
    Sch. of Inf. Sci. & Eng., Shandong Univ., Jinan
  • fYear
    2006
  • fDate
    Oct. 2006
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    As the development of photonics industry, there is a growing demand for accurate and efficient CAD tools for designing photonics devices and circuits. Compared with the EDA tools in R/F microwave and microelectronics, however, photonics CAD tools is still in its early stage. Following the successful paths of R/F microwave and microelectronic industries, we have developed a photonic circuit simulator. It breaks the traditional ideologies of simulation tools in the market. First of all, it is no longer method orientated and it is problem orientated. Different methods will be used for different problems. Secondly, it is in a hierarchical structure, which divided the design problem in four different layers and each layer focus on specific problems. It allows designer to decouple a big complex problem in to a number of small simpler problems. Thirdly, a lot of design knowledge is built inside the pre-defined libraries so that the new designers do not have to start from the scratch. Therefore, the demand on user´s knowledge is much lower and the learning curve is much shorter.
  • Keywords
    CAD; integrated circuit design; integrated optics; optical design techniques; optical engineering computing; CAD tools; RF microwaves; hierarchical structure; microelectronic industries; photonic circuit; photonic circuit simulator; photonic devices design; photonics industry; Arrayed waveguide gratings; Circuit simulation; Design automation; Finite difference methods; Microelectronics; Optical materials; Optical propagation; Optical waveguides; Photonics; Time domain analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Fiber Communication & Optoelectronic Exposition & Conference, 2006. AOE 2006. Asian
  • Conference_Location
    Shanghai, China
  • Print_ISBN
    978-0-9789217-0-5
  • Type

    conf

  • DOI
    10.1109/AOE.2006.307326
  • Filename
    4100036