Title :
Low voltage field emission from PbZr0.2Ti0.8O3-coated silicon nanotips
Author :
Fletcher, P.C. ; Mangalam, R.V.K. ; Martin, L.W. ; King, William P.
Author_Institution :
Dept. of Mech. Sci. & Eng., Univ. of Illinois, Urbana, IL, USA
Abstract :
We report field emission from nanometer-sharp tips of polarized PbZr0.2Ti0.8O3 (PZT) and silicon. The ferroelectric PZT emitters are a high-density array of single-crystal silicon tips that are coated with a 30 nm thick film of crystalline PZT in a batch fabrication process. The PZT emitter tips begin to emit electrons at fields as low as 2 V/μm and reach threshold emission at fields as low as 3.9 V/μm. This is considerably lower than the threshold field of 7.2 V/μm for uncoated silicon emitter tips. This improvement is about one order of magnitude improvement over previous publications for silicon tips. Using a Fowler-Nordheim analysis, we calculate the effective work function of the PZT film to be 1.00 eV and the field amplification factor to be 1525.
Keywords :
elemental semiconductors; epitaxial layers; ferroelectric thin films; field emitter arrays; lead compounds; nanofabrication; nanostructured materials; pulsed laser deposition; silicon; work function; zirconium compounds; Fowler-Nordheim analysis; PZT-Si; batch fabrication; crystalline materials; electron volt energy 1.00 eV; epitaxial film; ferroelectric emitters; field amplification factor; high-density array; low-voltage field emission; nanometer-sharp tip; polarized lead zirconium titanate-coated silicon nanotips; pulsed laser deposition; single crystal silicon tips; size 30 nm; thick film; threshold emission; work function; Arrays; Current measurement; Electric fields; Electron emission; Films; Silicon;
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2013 IEEE 26th International Conference on
Conference_Location :
Taipei
Print_ISBN :
978-1-4673-5654-1
DOI :
10.1109/MEMSYS.2013.6474272