DocumentCode :
3496608
Title :
Investigation of contact resistance evolution of Ir, Pt, W, Ni, Cr, Ti, Cu and Al over repeated hot-contact switching for NEMS switches
Author :
Chowdhury, Fahmida K. ; Pourzand, Hoorad ; Tabib-Azar, Massood
Author_Institution :
Electr. & Comput. Eng. Dept., Univ. of Utah, Salt Lake City, UT, USA
fYear :
2013
fDate :
20-24 Jan. 2013
Firstpage :
445
Lastpage :
448
Abstract :
This article reports on the evolution of contact resistance (Rc) of metal contacts over 100,000 cycles. A contact-mode atomic force microscope connected to a current versus voltage (I-V) measurement system was used and successive I-V measurements between a Cr-coated AFM conducting tip and Ir, Pt, W, Ni, Cr, Ti, Cu or Al thin-film metals on silicon nitride coated silicon in a nitrogen ambient were carried out. Adhesion forces between the samples and the conducting AFM tip was also measured. The best cyclic I-V performers were Ir, Pt, W & Ti. The trend in changing Rc seen in Ir, Pt and W are similar and can be attributed to factors such as their high Young´s modulus, high melting temperatures and high density and low adhesion forces. Ti yeilded the best I-V behavior where contact resistance improved slightly as a function of cycling. A relationship between adhesion forces and defect generation in the contact region is observed and the results of both sets of experiments are detailed here.
Keywords :
Young´s modulus; adhesion; aluminium; atomic force microscopy; chromium; coatings; contact resistance; copper; iridium; melting; metal-insulator boundaries; metallic thin films; nanoelectromechanical devices; nickel; platinum; titanium; tungsten; Al-SiN-Si; Cr-SiN-Si; Cu-SiN-Si; I-V measurements; Ir-SiN-Si; NEMS switches; Ni-SiN-Si; Pt-SiN-Si; Ti-SiN-Si; W-SiN-Si; Young modulus; adhesion forces; conducting tip; contact resistance evolution; contact-mode atomic force microscopy; current versus voltage measurement system; hot-contact switching; melting temperature; silicon nitride coated silicon; thin-film metals; Adhesives; Contact resistance; Force; Force measurement; Nickel; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2013 IEEE 26th International Conference on
Conference_Location :
Taipei
ISSN :
1084-6999
Print_ISBN :
978-1-4673-5654-1
Type :
conf
DOI :
10.1109/MEMSYS.2013.6474274
Filename :
6474274
Link To Document :
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