Title :
Combustion and material characterization of porous silicon nanoenergetics
Author :
Piekiel, N.W. ; Churaman, W.A. ; Morris, C.J. ; Currano, L.J.
Author_Institution :
Army Res. Lab., Adelphi, MD, USA
Abstract :
Certain porous silicon (PS) structures have demonstrated energetic characteristics when mixed with an appropriate oxidizer [1-4]. However, limited studies on the effect of PS structure on its combustion have been performed. This work investigates how various material properties of PS films; surface area, porosity and pore size, affect the combustion process. With pore sizes in the range of 2.6-5.2 nm and surface area reaching over 900 m2/g, these materials are capable of considerably fast reactions. Combustion characterization is performed through high speed imaging at a rate of 930,000 frames per second. Propagation speeds in the current study range from 300-1950 m/s, and some relationships between the pore characteristics and the propagation velocity are observed.
Keywords :
combustion; elemental semiconductors; explosives; porosity; porous materials; semiconductor thin films; silicon; Si; appropriate mixed oxidizer; combustion process; frames; high speed imaging rate; material properties; pore propagation velocity; pore size; porosity; porous silicon films; porous silicon nanoenergetics; porous silicon structures; surface area; Combustion; Fires; Material properties; Silicon; Surface treatment; System-on-chip;
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2013 IEEE 26th International Conference on
Conference_Location :
Taipei
Print_ISBN :
978-1-4673-5654-1
DOI :
10.1109/MEMSYS.2013.6474275