• DocumentCode
    3497302
  • Title

    Computer Vision Inspection for IC Wafer Based on Character of Pixels Distribution

  • Author

    Liming, Wu ; Fengjie, Wu ; Guitang, Wang

  • Author_Institution
    Fac. of Inf. Eng., Guangdong Univ. of Technol., Guangzhou
  • Volume
    2
  • fYear
    2008
  • fDate
    11-13 Nov. 2008
  • Firstpage
    248
  • Lastpage
    251
  • Abstract
    There are many vital defects in the process of fabrication of IC wafer. The redundancy material defect is an important factor of reducing the yield of IC, it mainly causes circuits to be connection failure, so it is important to recognize the redundancy material defect and ascertain the circuit´s failure style. In this paper, a simple and doable method of vision inspection for the redundancy material defect is presented. According to the image character of taken images, in order to improve image quality, the method of light compensation and morphological filter is used to eliminate the disturbed noise. Then, the projection theorem and the inspection method based on character of pixels distribution are used to recognize the connection circuits.
  • Keywords
    computer vision; inspection; integrated circuits; IC wafer fabrication; computer vision inspection; image character; pixels distribution; Computer vision; Etching; Hybrid integrated circuits; Inspection; Integrated circuit noise; Manufacturing processes; Optical filters; Optical noise; Pixel; Redundancy; IC wafer; Redundancy Material Defect;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Convergence and Hybrid Information Technology, 2008. ICCIT '08. Third International Conference on
  • Conference_Location
    Busan
  • Print_ISBN
    978-0-7695-3407-7
  • Type

    conf

  • DOI
    10.1109/ICCIT.2008.40
  • Filename
    4682248