DocumentCode
3497302
Title
Computer Vision Inspection for IC Wafer Based on Character of Pixels Distribution
Author
Liming, Wu ; Fengjie, Wu ; Guitang, Wang
Author_Institution
Fac. of Inf. Eng., Guangdong Univ. of Technol., Guangzhou
Volume
2
fYear
2008
fDate
11-13 Nov. 2008
Firstpage
248
Lastpage
251
Abstract
There are many vital defects in the process of fabrication of IC wafer. The redundancy material defect is an important factor of reducing the yield of IC, it mainly causes circuits to be connection failure, so it is important to recognize the redundancy material defect and ascertain the circuit´s failure style. In this paper, a simple and doable method of vision inspection for the redundancy material defect is presented. According to the image character of taken images, in order to improve image quality, the method of light compensation and morphological filter is used to eliminate the disturbed noise. Then, the projection theorem and the inspection method based on character of pixels distribution are used to recognize the connection circuits.
Keywords
computer vision; inspection; integrated circuits; IC wafer fabrication; computer vision inspection; image character; pixels distribution; Computer vision; Etching; Hybrid integrated circuits; Inspection; Integrated circuit noise; Manufacturing processes; Optical filters; Optical noise; Pixel; Redundancy; IC wafer; Redundancy Material Defect;
fLanguage
English
Publisher
ieee
Conference_Titel
Convergence and Hybrid Information Technology, 2008. ICCIT '08. Third International Conference on
Conference_Location
Busan
Print_ISBN
978-0-7695-3407-7
Type
conf
DOI
10.1109/ICCIT.2008.40
Filename
4682248
Link To Document