• DocumentCode
    3497804
  • Title

    A simple microwave plasma-enhanced chemical vapour deposition system for the production of carbon nanotubes

  • Author

    Harrison, Roland D. ; Jarvis, A. L. Leigh ; Babet, S. Sergio

  • Author_Institution
    Sch. of Eng. (Electr., Electron. & Comput.), Univ. of KwaZulu-Natal, Durban, South Africa
  • fYear
    2013
  • fDate
    9-12 Sept. 2013
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    A low-cost reactor has been designed and built to confine a microwave-induced plasma for carbon nanotube growth. The system utilises a magnetron and supporting electronics from a conventional microwave oven to establish and sustain the plasma. The plasma sphere remains stable and confined to the axis of the cylindrical vessel, as per simulation. Carbon nanotube growth was identified by scanning electron microscopy in preliminary experiments performed with ethanol as the hydrocarbon source, thiophene as the promoter, and hydrogen as the support gas.
  • Keywords
    carbon nanotubes; microwave materials processing; nanofabrication; plasma CVD; scanning electron microscopy; C; carbon nanotubes; cylindrical vessel; ethanol; magnetron; microwave plasma-enhanced chemical vapour deposition; plasma sphere; scanning electron microscopy; stability; supporting electronics; thiophene; Carbon; Carbon nanotubes; Electromagnetic heating; Microwave ovens; Microwave theory and techniques; Plasmas; Substrates; carbon; nanotechnology; plasma confinement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    AFRICON, 2013
  • Conference_Location
    Pointe-Aux-Piments
  • ISSN
    2153-0025
  • Print_ISBN
    978-1-4673-5940-5
  • Type

    conf

  • DOI
    10.1109/AFRCON.2013.6757861
  • Filename
    6757861