Title :
Nonlinearity reduction in silicon resonators by doping and re-orientation
Author :
Shahmohammadi, M. ; Fatemi, H. ; Abdolvand, Reza
Author_Institution :
Oklahoma State Univ., Tulsa, OK, USA
Abstract :
In this paper, it is shown for the first time that nonlinearity in n-type doped silicon micro-resonators can be reduced by modifying the doping concentration and the resonator alignment to a different crystalline orientation. Spring hardening, a trend opposite to the commonly-observed spring softening, is demonstrated in extensional resonators fabricated on a highly Phosphorus-doped (n~5×1019 cm-3) silicon substrate and oriented in the [100] direction. Therefore, it is hypothesized that for a specific level of doping concentration the nonlinear stiffness coefficients (k1 and k2) can be cancelled and the device will behave linearly for a large range of input power. It is observed that devices fabricated on an Arsenic-doped substrate with lower doping concentration (n~3×1019 cm-3) mechanically fail before they reach bifurcation, a preliminary proof for our hypothesis.
Keywords :
bifurcation; doping profiles; elastic constants; elemental semiconductors; microfabrication; micromechanical resonators; radiation hardening (electronics); silicon; softening; Si; Si:As; Si:P; [100] direction; arsenic-doped substrate; bifurcation; commonly-observed spring softening; crystalline orientation; doping concentration; extensional resonator fabrication; n-type doped microresonators; nonlinear stiffness coefficients; nonlinearity reduction; resonator alignment; spring hardening; Doping; Frequency response; Resonant frequency; Silicon; Softening; Springs; Substrates;
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2013 IEEE 26th International Conference on
Conference_Location :
Taipei
Print_ISBN :
978-1-4673-5654-1
DOI :
10.1109/MEMSYS.2013.6474362