DocumentCode
3498632
Title
Influence of the Ge profile on VBE and current gain mismatch in Advanced SiGe BICMOS NPN HBT with 200 GHz fT
Author
Dahlström, M. ; Walter, K. ; Von Bruns, S. ; Malladi, R.M. ; Newton, Kim M. ; Joseph, A.J.
Author_Institution
IBM Microelectron. Div., Essex Junction, VT
fYear
2006
fDate
8-10 Oct. 2006
Firstpage
1
Lastpage
4
Abstract
Transistor mismatch is a key parameter for the design and operation of advanced analog circuits. The paper presents for the first time data from several generations of BiCMOS technology nodes for VBE and current gain (beta) mismatch. The authors show that the 0.12 mum BiCMOS has a 3-a VBE mismatch of 0.63 mV-mum and beta mismatch of 0.24 %-mum. CBE NPNs have essentially the same but slightly lower mismatch than CBEBC NPNs. Very small and very long devices have increased mismatch, especially at high currents. The authors also present a physical model and experimental data showing the influence of the emitter-base Ge slope on the device mismatch
Keywords
BiCMOS analogue integrated circuits; Ge-Si alloys; heterojunction bipolar transistors; 0.12 micron; 200 GHz; BiCMOS analog circuits; SiGe; advanced BICMOS NPN HBT; advanced analog circuits; current gain mismatch; emitter-base; transistor mismatch; Analog circuits; BiCMOS integrated circuits; Circuit simulation; Germanium silicon alloys; Heterojunction bipolar transistors; Microelectronics; Photonic band gap; Silicon germanium; Voltage; Wiring; Bipolar/BiCMOS analog circuits; Ge profile; HBT; NPN; SiGe; VBE; base emitter voltage; bipolar modeling and simulation; device mismatch; mismatch;
fLanguage
English
Publisher
ieee
Conference_Titel
Bipolar/BiCMOS Circuits and Technology Meeting, 2006
Conference_Location
Maastricht
ISSN
1088-9299
Print_ISBN
1-4244-0458-4
Electronic_ISBN
1088-9299
Type
conf
DOI
10.1109/BIPOL.2006.311146
Filename
4100214
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