• DocumentCode
    3498632
  • Title

    Influence of the Ge profile on VBE and current gain mismatch in Advanced SiGe BICMOS NPN HBT with 200 GHz fT

  • Author

    Dahlström, M. ; Walter, K. ; Von Bruns, S. ; Malladi, R.M. ; Newton, Kim M. ; Joseph, A.J.

  • Author_Institution
    IBM Microelectron. Div., Essex Junction, VT
  • fYear
    2006
  • fDate
    8-10 Oct. 2006
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Transistor mismatch is a key parameter for the design and operation of advanced analog circuits. The paper presents for the first time data from several generations of BiCMOS technology nodes for VBE and current gain (beta) mismatch. The authors show that the 0.12 mum BiCMOS has a 3-a VBE mismatch of 0.63 mV-mum and beta mismatch of 0.24 %-mum. CBE NPNs have essentially the same but slightly lower mismatch than CBEBC NPNs. Very small and very long devices have increased mismatch, especially at high currents. The authors also present a physical model and experimental data showing the influence of the emitter-base Ge slope on the device mismatch
  • Keywords
    BiCMOS analogue integrated circuits; Ge-Si alloys; heterojunction bipolar transistors; 0.12 micron; 200 GHz; BiCMOS analog circuits; SiGe; advanced BICMOS NPN HBT; advanced analog circuits; current gain mismatch; emitter-base; transistor mismatch; Analog circuits; BiCMOS integrated circuits; Circuit simulation; Germanium silicon alloys; Heterojunction bipolar transistors; Microelectronics; Photonic band gap; Silicon germanium; Voltage; Wiring; Bipolar/BiCMOS analog circuits; Ge profile; HBT; NPN; SiGe; VBE; base emitter voltage; bipolar modeling and simulation; device mismatch; mismatch;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting, 2006
  • Conference_Location
    Maastricht
  • ISSN
    1088-9299
  • Print_ISBN
    1-4244-0458-4
  • Electronic_ISBN
    1088-9299
  • Type

    conf

  • DOI
    10.1109/BIPOL.2006.311146
  • Filename
    4100214