Title :
Yield models in a design for manufacturability environment: a bibliography
Author :
Cheek, Gary ; O´Donoghue, Geoff
Author_Institution :
Analog Devices Semicond., Wilmington, MA, USA
Abstract :
The bibliography has been compiled for the convenience and use of those in the semiconductor manufacturing area interested in yield modeling. Volumes have been written on the use of models to predict yield of VLSI circuits. The papers that comprise this bibliography address the topical area of yield models/evaluation and have been broken out into five area: yield models, critical area, defect density, layout/tools and books and review articles.
Keywords :
VLSI; integrated circuit manufacture; VLSI; bibliography; critical area; defect density; layout/tools; manufacturability environment; semiconductor manufacturing; yield modeling; Bibliographies; Electron devices; Integrated circuit modeling; Integrated circuit yield; Large scale integration; Solid state circuits; Statistics; Very large scale integration; Virtual manufacturing; Yield estimation;
Conference_Titel :
Semiconductor Manufacturing Science Symposium, 1993. ISMSS 1993., IEEE/SEMI International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-1212-0
DOI :
10.1109/ISMSS.1993.263686