DocumentCode :
3499832
Title :
Yield models in a design for manufacturability environment: a bibliography
Author :
Cheek, Gary ; O´Donoghue, Geoff
Author_Institution :
Analog Devices Semicond., Wilmington, MA, USA
fYear :
1993
fDate :
1993
Firstpage :
133
Lastpage :
135
Abstract :
The bibliography has been compiled for the convenience and use of those in the semiconductor manufacturing area interested in yield modeling. Volumes have been written on the use of models to predict yield of VLSI circuits. The papers that comprise this bibliography address the topical area of yield models/evaluation and have been broken out into five area: yield models, critical area, defect density, layout/tools and books and review articles.
Keywords :
VLSI; integrated circuit manufacture; VLSI; bibliography; critical area; defect density; layout/tools; manufacturability environment; semiconductor manufacturing; yield modeling; Bibliographies; Electron devices; Integrated circuit modeling; Integrated circuit yield; Large scale integration; Solid state circuits; Statistics; Very large scale integration; Virtual manufacturing; Yield estimation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Science Symposium, 1993. ISMSS 1993., IEEE/SEMI International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-1212-0
Type :
conf
DOI :
10.1109/ISMSS.1993.263686
Filename :
263686
Link To Document :
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