Title :
Impact of compliance current overshoot on high resistance state, memory performance, and device yield of HfOx based resistive memory and its solution
Author :
Chen, Yu-Sheng ; Liu, Wen-Hsing ; Lee, Heng-Yuan ; Chen, Pang-Shiu ; Wang, Sum-Min ; Tsai, Chen-Han ; Hsu, Yen-Ya ; Gu, Pei-Yi ; Chen, Wei-Su ; Chen, Frederick ; Lien, Chen-Hsin ; Tsai, Ming-Jinn
Abstract :
The evidence of degraded RHIGH or permanent damage of the device induced by the current overshoot in the forming/SET step is demonstrated and a possible scenario for this result is revealed. Dependence of the overshooting current on the cathodic electrode and device configuration are discussed. Reduction of the overshooting current by a transistor can enhance the memory performances. The devices with high Rιιιgii (>; 1 MOhm) and endurance (>; 100M cycles) are achieved. With an exterior resistor, the HfOχ/TaN device shows a robust repetitive switching.
Keywords :
bipolar transistor switches; hafnium compounds; memristors; semiconductor storage; HfOx-Ti; bottom electrode; current overshoot; device yield; high resistance state; resistive memory performance; switching; Electrodes; Integrated circuits; Performance evaluation; Resistance; Switches; Tin; Transistors;
Conference_Titel :
VLSI Technology, Systems and Applications (VLSI-TSA), 2011 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4244-8493-5
DOI :
10.1109/VTSA.2011.5872252