Title :
Characterization study of plasma polymerized hexamethyldisiloxane thin films
Author :
Lee, Sang-Hee ; Park, Jong-Kwan ; Park, Gu-Bum ; Cho, Ki-Sun ; Woo, Ho-Whan ; Lee, Duck-Chool
Author_Institution :
Inha Univ., Inchon, South Korea
Abstract :
In this paper, we investigated characteristics of hexamethyldisiloxane thin films by plasma polymerization. Thin films were prepared by interelectrode capacitively coupled type apparatus and in conditions with carrier gas flow rate of 11 [cc/min], gas pressure of 0.1 [Torr], discharge frequency of 13.56 [MHz] and discharge power of 30-90 [W]. The relative dielectric constant and dielectric loss tangent of thin films showed 3.212-3.805 and 0.0026 ~0.0451 in alternating frequency of 103-106 [Hz]
Keywords :
dielectric losses; dielectric thin films; materials preparation; permittivity; polymerisation; 0.1 torr; 13.56 MHz; 1E3 to 1E6 Hz; 30 to 90 W; carrier gas flow rate; dielectric loss tangent; discharge frequency; discharge power; gas pressure; hexamethyldisiloxane thin films; interelectrode capacitively coupled type apparatus; plasma polymerization; relative dielectric constant; Dielectric constant; Dielectric losses; Dielectric materials; Dielectric thin films; Fluid flow; Frequency; Plasma materials processing; Plasma properties; Polymer films; Substrates;
Conference_Titel :
Properties and Applications of Dielectric Materials, 1997., Proceedings of the 5th International Conference on
Conference_Location :
Seoul
Print_ISBN :
0-7803-2651-2
DOI :
10.1109/ICPADM.1997.616516
