DocumentCode :
3502083
Title :
Low temperature bonding method using Cu micro cones
Author :
Qin Lu ; Zhuo Chen ; Anmin Hu ; Ming Li ; Dali Mao
Author_Institution :
Sch. of Mater. Sci. & Eng., Shanghai Jiao Tong Univ., Shanghai, China
fYear :
2012
fDate :
13-16 Aug. 2012
Firstpage :
224
Lastpage :
226
Abstract :
An ideal low temperature bonding method was studied. Cu cones were prepared by electroless plating. Heating and pressure were used in the bonding process between Cu cones and Sn-3.0Ag-0.5Cu solder. It´s a solid state bonding method because the bonding process was performed below the melting point of solder. Shear strength was measured by bonding tester. Morphologies of Cu cones, fracture surfaces and bonding interfaces were analyzed by field emission scanning electron microscope. Results showed that bonding strength was superior with proper bonding conditions. Mechanical interlock produced by insertion was a key success factor. Fast solid state diffusion also played an important role during the bonding process.
Keywords :
bonding processes; electroplating; field emission ion microscopes; fracture; scanning electron microscopes; shear strength; Sn-Ag-Cu; bonding interface; bonding process; bonding strength; bonding tester; copper microcone; electroless plating; field emission scanning electron microscope; fracture surface; low temperature bonding method; mechanical interlock; shear strength measurement; solid state bonding method; solid state diffusion; Abstracts; Bonding; Educational institutions; Heating; Nickel; Solids; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Packaging Technology and High Density Packaging (ICEPT-HDP), 2012 13th International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4673-1682-8
Electronic_ISBN :
978-1-4673-1680-4
Type :
conf
DOI :
10.1109/ICEPT-HDP.2012.6474606
Filename :
6474606
Link To Document :
بازگشت