Title :
Advanced underfill materials
Author :
Qiaohong Huang ; Takano, Takeshi ; Guino, R. ; Ruihua Li
Author_Institution :
Henkel Electron. Mater. LLC, Irvine, CA, USA
Abstract :
Smart phone and tablet devices are making our lives more convenient, informative, and enjoyable. Underpinning the development of these devices are semiconductor package technologies, which are being pushed to the limit. The Controlled Collapse Chip Connection (C4) process had been the major packaging technology for flip chip devices, which provides more I/Os and faster communication speeds. However, lower silicon node, fine pitch bumping and wafer thinning make the silicon chip more fragile. The delicate nature of modern silicon chips are making stress management and structure protection major topics for advanced semiconductor package and process design. Henkel provides a wide range of underfill materials that address the challenges of new electronic package designs. Non-conductive paste (NCP) products with thermal compression bonding (TCB) process enable the use of fine pitch copper pillar bumping with lower silicon node dies. New capillary underfill (CUF) development offers lower warpage while maintaining high Tg and modulus. Wafer applied underfill film (WAUF) has also been developed and is a key technology for emerging 2.5D and 3D IC packages.
Keywords :
bonding processes; chip scale packaging; elemental semiconductors; flip-chip devices; integrated circuit packaging; notebook computers; semiconductor device packaging; silicon; smart phones; three-dimensional integrated circuits; 3D IC packages; C4 process; CUF development; NCP products; TCB process; WAUF; advanced underfill materials; capillary underfill development; communication speeds; controlled collapse chip connection process; electronic package design; fine pitch bumping; fine pitch copper pillar bumping; flip chip device packaging technology; nonconductive paste products; process design; semiconductor package technologies; silicon node; smart phone; stress management; tablet devices; thermal compression bonding process; wafer applied underfill film; wafer thinning; Bonding; Bonding forces; Copper; Films; Integrated circuits; Silicon;
Conference_Titel :
Electronic Packaging Technology and High Density Packaging (ICEPT-HDP), 2012 13th International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4673-1682-8
Electronic_ISBN :
978-1-4673-1680-4
DOI :
10.1109/ICEPT-HDP.2012.6474659